Laser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology
Author: Fuccio Cristiano,Antonino La Magna
Publsiher: Woodhead Publishing
Total Pages: 426
Release: 2021-04-21
ISBN: 0128202564
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Laser Annealing Processes in Semiconductor Technology Book Excerpt:

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Laser Annealing Processes in Semiconductor Technology

Laser Annealing Processes in Semiconductor Technology
Author: Fuccio Cristiano,Antonino La Magna
Publsiher: Elsevier
Total Pages: 426
Release: 2021-04-23
ISBN: 0128202556
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Laser Annealing Processes in Semiconductor Technology Book Excerpt:

Intro -- Laser Annealing Processes in Semiconductor Technology: Theory, Modeling, and Applications in Nanoelectronics -- Copyright -- Contents -- Contributors -- Preface -- Chapter 1: Historical evolution of pulsed laser annealing for semiconductor processing -- 1.1. Section 1: Introduction -- 1.2. Section 2: Excimer laser technology -- 1.2.1. Characteristics of the beam emitted by excimer lasers -- 1.2.2. Parameters that are relevant for the light-material interaction -- 1.2.3. Optics that can be used to shape the beam and prepare it for industrial applications -- 1.3. Section 3: Excimer laser annealing for low-temperature polycrystalline silicon technology -- 1.3.1. Excimer Laser process engineering -- 1.3.1.1. Trailing-/leading-edge scanning mode -- 1.3.1.2. Sequential lateral solidification -- 1.3.1.3. Two-pass excimer Laser process -- 1.3.1.4. Phase-modulated excimer laser annealing -- 1.3.1.5. Micro-Czochralski technique -- 1.3.2. Excimer laser-crystallized thin-film transistors -- 1.4. Section 4: Excimer laser annealing in MOS technology -- 1.4.1. Logic applications -- 1.4.2. Power MOS and RF/microwave applications -- 1.5. Conclusions -- References -- Chapter 2: Laser-matter interactions -- 2.1. Introduction -- 2.2. Absorption of electromagnetic radiation -- 2.3. Thermal effects of laser radiation -- 2.4. Differences across the electromagnetic spectrum -- 2.5. Diffusion model extension to millisecond regime -- 2.5.1. Thermal interaction -- 2.5.2. Diffusion simulation and activation kinetics -- 2.6. Concluding remarks -- References -- Chapter 3: Atomistic modeling of laser-related phenomena -- 3.1. Introduction -- 3.2. Atomistic simulation techniques -- 3.2.1. Ab initio -- 3.2.2. Tight binding -- 3.2.3. Classical molecular dynamics -- 3.2.4. Kinetic Monte Carlo -- 3.2.5. Multiscale modeling.

Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports
Author: Anonim
Publsiher: Unknown
Total Pages: 1366
Release: 1986
ISBN: 1928374650XXX
Category: Aeronautics
Language: EN, FR, DE, ES & NL

Scientific and Technical Aerospace Reports Book Excerpt:

Laser Assisted Microtechnology

Laser Assisted Microtechnology
Author: Simeon M. Metev,Vadim P. Veiko
Publsiher: Springer Science & Business Media
Total Pages: 270
Release: 2013-03-09
ISBN: 3642872719
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Laser Assisted Microtechnology Book Excerpt:

Laser-Assisted Microtechnology introduces the principles and techniques of laser-assisted microtechnology with emphasis on micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The experimental and theoretical physico-chemical basis of every technological process is presented in detail. On the basis of some characteristic examples of applications, the capabilities of the technological methods as well as the optimum conditions for their realization are discussed. In this second edition, besides the actualization of the literature, a new chapter concerning the laser-assisted wet chemical micro etching, has been added. This is a new method for direct 3D-micro structuring of solids, with a number of potential applications.

Silicon Compatible Materials Processes and Technologies for Advanced Integrated Circuits and Emerging Applications 8

Silicon Compatible Materials  Processes  and Technologies for Advanced Integrated Circuits and Emerging Applications 8
Author: F. Roozeboom,P.J. Timans,K. Kakushima,H. Jagannathan,Z. Karim,E. P. Gusev,S. De Gendt
Publsiher: The Electrochemical Society
Total Pages: 188
Release: 2018-05-04
ISBN: 1607688344
Category: Science
Language: EN, FR, DE, ES & NL

Silicon Compatible Materials Processes and Technologies for Advanced Integrated Circuits and Emerging Applications 8 Book Excerpt:

Silicon Compatible Emerging Materials Processes and Technologies for Advanced CMOS and Post CMOS Applications 9

Silicon Compatible Emerging Materials  Processes  and Technologies for Advanced CMOS and Post CMOS Applications 9
Author: F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan
Publsiher: The Electrochemical Society
Total Pages: 176
Release: 2019-05-17
ISBN: 1607688689
Category: Science
Language: EN, FR, DE, ES & NL

Silicon Compatible Emerging Materials Processes and Technologies for Advanced CMOS and Post CMOS Applications 9 Book Excerpt:

This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

Semiconductor Technology ISTC 2001

Semiconductor Technology  ISTC 2001
Author: Ming Yang
Publsiher: Unknown
Total Pages: 688
Release: 2001
ISBN: 1928374650XXX
Category: Semiconductors
Language: EN, FR, DE, ES & NL

Semiconductor Technology ISTC 2001 Book Excerpt:

Advances in Laser Materials Processing

Advances in Laser Materials Processing
Author: J. R. Lawrence
Publsiher: Woodhead Publishing
Total Pages: 802
Release: 2017-09-20
ISBN: 0081012535
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Advances in Laser Materials Processing Book Excerpt:

Advances in Laser Materials Processing: Technology, Research and Application, Second Edition, provides a revised, updated and expanded overview of the area, covering fundamental theory, technology and methods, traditional and emerging applications and potential future directions. The book begins with an overview of the technology and challenges to applying the technology in manufacturing. Parts Two thru Seven focus on essential techniques and process, including cutting, welding, annealing, hardening and peening, surface treatments, coating and materials deposition. The final part of the book considers the mathematical modeling and control of laser processes. Throughout, chapters review the scientific theory underpinning applications, offer full appraisals of the processes described and review potential future trends. A comprehensive practitioner guide and reference work explaining state-of-the-art laser processing technologies in manufacturing and other disciplines Explores challenges, potential, and future directions through the continuous development of new, application-specific lasers in materials processing Provides revised, expanded and updated coverage

Laser Annealing of Semiconductors

Laser Annealing of Semiconductors
Author: J Poate
Publsiher: Elsevier
Total Pages: 576
Release: 2012-12-02
ISBN: 0323145426
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Laser Annealing of Semiconductors Book Excerpt:

Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Ion Implantation in Semiconductors 1976

Ion Implantation in Semiconductors 1976
Author: Fred Chernow
Publsiher: Springer Science & Business Media
Total Pages: 754
Release: 2012-12-06
ISBN: 1461341965
Category: Science
Language: EN, FR, DE, ES & NL

Ion Implantation in Semiconductors 1976 Book Excerpt:

The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done.

ULSI Process Integration 5

ULSI Process Integration 5
Author: Cor L. Claeys
Publsiher: The Electrochemical Society
Total Pages: 509
Release: 2007
ISBN: 1566775728
Category: Integrated circuits
Language: EN, FR, DE, ES & NL

ULSI Process Integration 5 Book Excerpt:

The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.

Rapid Thermal and Other Short time Processing Technologies II

Rapid Thermal and Other Short time Processing Technologies II
Author: Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. High Temperature Materials Divisions
Publsiher: The Electrochemical Society
Total Pages: 458
Release: 2001
ISBN: 9781566773157
Category: Integrated circuits
Language: EN, FR, DE, ES & NL

Rapid Thermal and Other Short time Processing Technologies II Book Excerpt:

"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

Subsecond Annealing of Advanced Materials

Subsecond Annealing of Advanced Materials
Author: Wolfgang Skorupa,Heidemarie Schmidt
Publsiher: Springer Science & Business Media
Total Pages: 321
Release: 2013-12-16
ISBN: 3319031317
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Subsecond Annealing of Advanced Materials Book Excerpt:

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

Temperature Measurement during Millisecond Annealing

Temperature Measurement during Millisecond Annealing
Author: Denise Reichel
Publsiher: Springer
Total Pages: 112
Release: 2016-01-07
ISBN: 365811388X
Category: Science
Language: EN, FR, DE, ES & NL

Temperature Measurement during Millisecond Annealing Book Excerpt:

Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures.

Nanoscience and Technology

Nanoscience and Technology
Author: Chun Li Bai,Si Shen Xie,Xing Zhu
Publsiher: Trans Tech Publications Ltd
Total Pages: 1600
Release: 2007-03-15
ISBN: 3038131385
Category: Technology & Engineering
Language: EN, FR, DE, ES & NL

Nanoscience and Technology Book Excerpt:

Volume is indexed by Thomson Reuters CPCI-S (WoS). Nanotechnology has been a priority research field in many countries, because new discoveries in this field have the potential power to unravel new phenomena and new principles of materials use. This collection of knowledge concerning frontier issues in nanotechnology will aid the further promotion of the integration of nanotechnology and industry.

Zinc Compounds Advances in Research and Application 2013 Edition

Zinc Compounds   Advances in Research and Application  2013 Edition
Author: Anonim
Publsiher: ScholarlyEditions
Total Pages: 906
Release: 2013-06-21
ISBN: 1481693476
Category: Science
Language: EN, FR, DE, ES & NL

Zinc Compounds Advances in Research and Application 2013 Edition Book Excerpt:

Zinc Compounds—Advances in Research and Application: 2013 Edition is a ScholarlyBrief™ that delivers timely, authoritative, comprehensive, and specialized information about ZZZAdditional Research in a concise format. The editors have built Zinc Compounds—Advances in Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about ZZZAdditional Research in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Zinc Compounds—Advances in Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.

Point Defects in Materials

Point Defects in Materials
Author: F. Agulló-López,Charles Richard Arthur Catlow,Peter David Townsend
Publsiher: Unknown
Total Pages: 445
Release: 1988
ISBN: 1928374650XXX
Category: Materials
Language: EN, FR, DE, ES & NL

Point Defects in Materials Book Excerpt:

This text provides an up-to-date coverage of the theoretical and experimental tools required for fundamental studies of point defects, with illustrative examples from a wide range of inorganic materials. On the experimental side a strong emphasis is placed on the powerful resonance and hyperfine methods which give detailed information on defect structures. Theoretical chapters cover statistical and quantum mechanical methods, particularly the computer simulations techniques which are now widely employed. The examples of applications of defect properties highlight the benefits of a controlled inclusion of defect properties for modern advanced technologies. This work provides coverage of the theoretical tools required for defect study, putting strong emphasis on the wide range of experimental techniques needed for analysis. Particular attention has been given to the powerful resonance and hyperfine methods which often give more detailed data than classical methods.

LBL Research Review

LBL Research Review
Author: Anonim
Publsiher: Unknown
Total Pages: 135
Release: 1988
ISBN: 1928374650XXX
Category: Nuclear energy
Language: EN, FR, DE, ES & NL

LBL Research Review Book Excerpt:

Microelectronics Technology and Devices

Microelectronics Technology and Devices
Author: Cor L. Claeys
Publsiher: The Electrochemical Society
Total Pages: 574
Release: 2005
ISBN: 9781566774260
Category: Science
Language: EN, FR, DE, ES & NL

Microelectronics Technology and Devices Book Excerpt:

Electricity from Photovoltaic Solar Cells Process development

Electricity from Photovoltaic Solar Cells  Process development
Author: Anonim
Publsiher: Unknown
Total Pages: 84
Release: 1986
ISBN: 1928374650XXX
Category: Photovoltaic power generation
Language: EN, FR, DE, ES & NL

Electricity from Photovoltaic Solar Cells Process development Book Excerpt: